Every revision starts again.
Traditional workflows require a new physical chrome photomask for each design change, adding recurring cost and weeks of waiting before the next experiment.
Semiconductor capital equipment
Prakaash Instruments is developing a tabletop maskless direct-write lithography system for research-scale semiconductor and microfabrication prototyping.
Indian researchers working on microchips, sensors, and photonics devices face both a mask-dependent workflow and continued dependence on imported lithography equipment.
Traditional workflows require a new physical chrome photomask for each design change, adding recurring cost and weeks of waiting before the next experiment.
High-cost imported tools, overseas servicing, and long procurement cycles make dedicated patterning capacity difficult for many research teams to access.
A research-scale instrument being designed to make early microfabrication experimentation faster, more accessible, and more controllable for Indian labs.
Digital layouts are converted into exposure patterns without requiring a new physical mask for each design revision.
Designed for die pieces and 2–4 inch research wafers, with the needs of academic and R&D prototyping in mind.
Direct patterning inside the laboratory can reduce external dependencies and help teams retain control over sensitive device layouts.
To build indigenous machines and tools used for fabricating chips, forming a core foundation of India’s domestic semiconductor ecosystem.
Founder
Ravi co-developed IIT Mandi’s first Mars Rover prototype and later led a 26-member multidisciplinary team on its second-generation rover. Prakaash Instruments brings the same first-principles approach to precision semiconductor equipment.